Mostrando entradas con la etiqueta II 2010_1 EES ROSSANA HERNADEZ. Mostrar todas las entradas
Mostrando entradas con la etiqueta II 2010_1 EES ROSSANA HERNADEZ. Mostrar todas las entradas

sábado, 26 de junio de 2010

Growth and In Situ Characterisation of Dilute Nitride Quantum Well Structures

In this work epitaxial growth and in situ characterisation of dilute nitride quantum well (QW) structures are studied. Dilute nitrides are III-V compound semiconductors with low (typically < 5%) composition of nitrogen in the lattice. Metal organic vapor phase epitaxial (MOVPE) system was used to grow the structures and in situ reflectance monitoring in normal incidence at a wavelength of 635 nm was utilised to study the growth process of the structures. Ex situ characterisation was performed by x-ray diffractometry and photoluminescence measurements.
The nitrogen content of (In)GaAsN was found to depend on many MOVPE growth parameters. Increased nitrogen content was obtained with decreasing growth temperature, increasing DMHy/V and TBAs/III ratios and when nitrogen (N2) was used as a carrier gas instead of hydrogen (H2).
In situ reflectance data was measured during growth of GaAsN/GaAs, InGaAs/GaAs and InGaAsN/GaAs multi quantum well (MQW) structures. The reflectance curve was observed to be different when MQW structures with different compositions were grown. The reflectance data was analysed by an experimental method utilising the dependence of the reflectance change observed during growth of the QW on the QW composition. Additionally, reflectance curves for multi layer stacks were calculated and the measured curves were compared to the calculated ones. With both methods the sample composition can be determined in situ if the growth rates of the layers are known.
In the process of comparing calculated and measured reflectance curves, the high temperature complex refractive indices of the various QW materials were obtained. The imaginary part of the complex refractive index of (In)GaAsN was found to be linearly dependent on the nitrogen content, as well as both real and imaginary parts of the complex refractive index of InGaAs depended linearly on the indium content. However, changing the nitrogen content did not change the real part of the complex refractive index of (In)GaAsN.

ROSSANA HERNANDEZ
ESTADO SOLIDO


Liquid Phase Epitaxial Growth of Dilute Nitrides for the Mid-infrared

We are interested in the incorporation of nitrogen into semiconductors such as GaAs, InAs and GaSb. This is important because the band gap of the parent III/V semiconductor is substantially reduced by the incorporation of very small amounts of nitrogen. These so-called "dilute nitrides" show promise for use in tailoring the wavelength and efficiency of novel semiconductor lasers and other optoelectronic devices. Although GaAsN and InGaAsN are currently being studied mainly for their applications in photodetectors and lasers in the 1.3 to 1.55 um telecomms wavelength range there is far less research into dilute nitride compounds for the mid-infrared (2-5 um) spectral range which is rich in applications. However, there are problems associated with incorporation of N and degradation of the crystalline quality and especially as nitrogen content in the material is increased beyond 1%.
This project seeks to investigate the growth of dilute nitrides for the mid-infrared spectral range using growth from the liquid phase rather than from the gas phase.One key advantage of this approach is that we do not need any N plasma to introduce the nitrogen atoms and so we can avoid all the damage from the energetic N ion species generated as a by-product from the plasma source normally used in vapour phase growth. Liquid phase epitaxy (LPE) is well known to produce material of excellent crystalline perfection. The proposed project seeks to build on our existing expertise in LPE growth and mid-infrared optoelectronics at Lancaster and study the resulting material properties of GaAsN, InAsN, GaSbN with a view towards evaluating their potential for use in mid-infrared optoelectronic devices. We aim to investigate both bulk materials and also corresponding dilute N nanostructures.
The preparation of dilute N III-V alloys with high quantum efficiency would be a real breakthrough, particularly for use within mid-infrared light sources and detectors for which there are many practical applications. Moreover, if the approach proves successful it can be readily extended to other technologically important alloys such as InGaAsN and GaAsPN.
ROSSANA HERNANDEZ
ESTADO SOLIDO


Dilute Nitrides

Highly mismatched alloys include a class of III-V and II-VI compound semiconductors in which the anion species is partially replaced with an isoelectronic element of much different electronegatively and/or covalent radius. These alloys exhibit large-scale bowing of the bandgap among other interesting properties upon the incorporation of even a few percent of the species being alloyed. Among these HMAs are dilute III-V nitrides, notably GaNxAs1-x, which exhibits a reduction of the band gap by as much as 180 meV per N mole fraction, x (Fig. 1). Comparably large band gap reductions have also been observed in other III-Nx-V1-x alloys such as GaInNAs, GaNP, InNP and AlGaNAs. The strong dependence of the band gap on the N content has made these dilute III-V nitrides important materials for a variety of applications, including long wavelength optoelectronic devices and high efficiency hybrid solar cells.

The unusually strong dependence of the fundamental gap on the N content in the group III-N-V alloys has been explained by a band anticrossing model (BAC). The BAC model takes into account an anticrossing interaction between localized N states and the extended states of the host semiconductor matrix. Such interaction splits the conduction band into two subbands, E- and E+. The downward shift of the lower subband (E-) is responsible for the reduction of the fundamental band gap and the optical transition from the valence band to the upper subband (E+) accounts for the high-energy edge. The model has been successfully used to quantitatively describe the dependencies of the upper and lower subband energies on hydrostatic pressure and on N content of Ga1-yInyNxAs1-x, Ga1-yAlyNxAs1-x, InNxP1-x and GaNxP1-x alloys.
The BAC model not only explains the band gap reduction in III-Nx-V1-x alloys but it also predicts that the N-induced modifications of the conduction band may have profound effects on the transport properties of this material system.
In particular, the downward shift of the conduction band edge and the enhancement of the density of state effective mass in GaInNAs may lead to much enhanced maximum electron concentration nmax. Recent experiments have confirmed such prediction and showed that the modified conduction band in GaNxAs1-x enables a large enhancement in the maximum achievable free electron concentration nmax as compared to GaAs (Fig. 2). While group VI donors (Se, S) led to increased maximum carrier concentration in GaNxAs1-x, group IV donors (Si, Ge) in GaNxAs1-x resulted in a highly resistive layer. This disparity in the behavior of group VI and IV donors can be explained by an entirely new effect in which an electrically active substitutional group IV donor and an isovalent N atom passivate each others' electronic effects. This mutual passivation occurs in Si doped GaNxAs1-x through the formation of nearest neighbor SiGa-NAs pairs. Consequently, Si doping in GaNxAs1-x under equilibrium conditions results in a highly resistive GaNxAs1-x layer with the fundamental band gap governed by a net "active" N, roughly equal to the total N content minus the Si concentration.
ROSSANA HERNANDEZ
ESTADO SOLIDO


The Physics and Technology of Dilute Nitrides

Dilute nitrides have emerged from conventional III–V semiconductors such as GaAs or InP by the insertion of nitrogen into the group V sub-lattice, which has a profound influence on the electronic properties of these materials and allows widely extended band structure engineering. This is expected to lead to novel devices, e.g. for optical data transmission, solar cells, biophotonics or gas sensing, some of which are already making their way into the market. Unlike in all other cases, where a reduction in bandgap energy is achieved by inserting an element that increases the lattice constant, N accomplishes this and at the same time reduces the lattice constant. Thus smaller bandgaps can be achieved and the unusual role of N in the lattice also allows a tailoring of band alignments. Both of these effects have opened up a new dimension of bandgap engineering and the rapid progress in the field led to the demonstration of high quality 1300 nm lasers on GaAs and eventually to the realization of the first VCSELs that can be mass produced at low cost and emit at 1300 nm. This in turn will allow extending inexpensive data transmission through optical fibers from the present range of about 300 m to a distance of 10 to 20 km and at the same time increasing the data rate by about a factor of four. Thus it will enable metro-area data links, which are presently considered to be the bottleneck for large-scale optical communications. Furthermore, the fact that GaNP and related alloys can be grown lattice-matched on Si substrates has offered intriguing new possibilities of OEIC and integration of efficient III–V optoelectronic devices with the mainstream microelectronics based on Si.

Despite their promising applications and the first encouraging experimental results, very little is known about the physical properties of such alloys. For instance the difficulty of incorporating nitrogen into GaInAs while maintaining good optical quality has provoked much work to establish an understanding of the underlying factors determining the optical quality of GaInNAs, such as composition, growth and annealing conditions. We are still far from establishing an understanding of the band structure and its dependence on composition. Fundamental electronic interactions such as electron–electron and electron–phonon scattering, dependence of effective mass on composition, strain and orientation, quantum confinement effects, effects of localized nitrogen states on high field transport and on galvanometric properties, and mechanisms for light emission in these materials, are yet to be fully understood. Nature and formation mechanisms of grown-in and processing-induced defects that are important for material quality and device performance are still unknown. Such knowledge is required in order to design strategies to efficiently control and eliminate harmful defects. For many potential applications (such as solar cells, HBTs) it is essential to get more information on the transport properties of dilute nitride materials. The mobility of minority carriers is known to be low in GaInNAs and related material. The experimental values are far from reaching the theoretical ones, due to defects and impurities introduced in the material during the growth. The role of the material inhomogeneities on the lateral carrier transport also needs further investigation.
From the device's point of view most attention to date has been focused on the GaInNAs/GaAs system, mainly because of its potential for optoelectronic devices covering the 1.3–1.55 µm data and telecommunications wavelength bands. As is now widely appreciated, these GaAs-compatible structures allow monolithic integration of AlGaAs-based distributed Bragg reflector mirrors (DBRs) for vertical cavity surface-emitting lasers with low temperature sensitivity and compatibility with AlOx-based confinement techniques. In terms of conventional edge-emitting lasers (EELs), the next step is to extend the wavelength range for cw room-temperature operation, as well as improving the spectral purity, modulation speed and peak power output. Many applications in medicine, environmental sensing and communications can be addressed with the achievement of significant improvements in these parameters. Semiconductor optical amplifiers (SOAs) are also important devices of interest, since it is widely predicted that the market for SOAs in photonic access networks will increase dramatically in the next few years. In addition to EELs and SOAs, vertical cavity surface-emitting lasers (VCSELs), vertical external cavity surface-emitting lasers (VECSELs), vertical cavity semiconductor optical amplifiers (VCSOAs), and semiconductor saturable absorber mirrors (SESAMs) are of increasing importance.
The VECSELs can potentially incorporate saturable absorbers for very high repetition rate (~100 GHz) pulsed and potentially MEMS-tuneable sources. VECSEL devices in the 2–3 µm range for applications in e.g. free-space optical (FSO) communications, are possible using InAsN/InGaAs/InP with AlGaAs metamorphic mirror growth. Semiconductor saturable-absorber mirror structures (SESAMs) have demonstrated widespread applicability for self-starting passive mode locking of (diode-pumped) solid-state lasers, to produce high-performance picosecond and femtosecond laser sources for scientific, instrumentation and industrial use. Very recently, these devices have also shown applicability for ultra short pulse generation at >GHz repetition rates, both in DPSS lasers and surface-emitting semiconductor lasers. These devices are undoped monolithic DBR structures incorporating one or more quantum wells for saturable absorption. Low-loss and high-damage threshold requirements demand pseudomorphic growth, and have, until very recently, essentially limited these devices to the 800–1100 nm range, but extension beyond this range is urgently required by a host of mode locking applications. In addition to these devices modulators and photodiodes, including quantum well infrared photodetectors (QWIPs) and resonant cavity-enhanced photodiodes (RCEPDs) based on dilute nitrides need to be investigated extensively.
To date, most theoretical attention has been focused on understanding the band structure of the GaInAsN/GaAs system and on evaluating gain spectra and threshold conditions for 1.3 µm lasers. However, as our understanding of band structure and the effects of strain, defects, etc in dilute nitrides improves we can calculate the electrical and optical properties, including radiative and non-radiative recombination for the materials and structures of interest. The spontaneous and stimulated emission rates have already been calculated for GaInNAs at 1.3 µm by many authors, but extension to other dilute nitrides and other wavelength ranges still represents a major challenge. Many-body effects, including exchange-correlation effects, are essential for accurate models of gain spectra in lasers and optical amplifiers. The differential gain is a key parameter for laser modulation and remains an important subject of study as new materials and structures are explored. Similarly the differential refractive index and linewidth enhancement factor have strong influences on laser spectrum (chirp, linewidth), dynamics and noise, and these must also be studied theoretically. As regards to non-radiative recombination, in addition to recombination through defects, the Auger effect is of especial significance for wavelengths beyond 1 µm and is a worthy subject for theoretical study. The converse effect, impact ionization, is of key importance for avalanche photodiodes (APDs) and has yet to be evaluated for the dilute nitride materials. Inter-valence band absorption (IVBA) is of significance, as a possible cause of temperature sensitivity in lasers and this must be investigated theoretically in the dilute nitrides. Third-order non-linear optical coefficients should be calculated in order to assess the scope for all-optical signal processing components within the dilute nitrides. Electro-absorption and electro-refractive effects—Franz-Keldysh (FK) and quantum-confined Stark effect (QCSE)
need to be studied theoretically in view of their importance for optical modulators.
ROSSANA HERNANDEZ
ESTAD SOLIDO


Engages in collaborative research with University of Houston

QuantaSol Ltd, an independent designer and manufacturer of strain-balanced quantum-well solar cells, has exclusively licensed advanced materials growth technology from the University of Houston to make its manufacturing process simpler and cheaper, while further improving solar cell efficiency.
"We've already tested the benefits of using Houston's dilute nitride materials in the way we engineer quantum wells in our cells," said Keith Barnham, CSO and co-founder of QuantaSol. "The exclusive worldwide licence is a strategic move to ensure we maintain our performance advantage, and we will work with our colleagues in Houston to develop the techniques further in commercial production in 2010."
QuantaSol combines nanostructures, 'quantum wells', of two or more different alloys, in order to obtain synthetic crystals. The crystalline structure can be tuned during manufacture to overcome the absorption problems associated with current concentrator photo-voltaic (CPV) cell designs. The quantum well effect also greatly enhances the photovoltaic conversion efficiency, as already proven by its recent world record efficiency single junction device. Ultimately QuantaSol will produce highly efficient triple junction CPV devices in 2010.The use of dilute nitrides will allow QuantaSol to reduce the number of quantum well layers it needs to introduce into each junction, while maintaining or increasing solar efficiency.
This further reduces the thickness and manufacturing cost of its production devices."This is the first major collaboration QuantaSol has announced," said Chris Shannon, QuantaSol's new CEO. "It indicates just how close the company is getting to being able to produce very efficient devices in production quantities. I'm really looking forward to the progress we will deliver over the next 12 months."Chris Shannon is an experienced semiconductor, optics and photonics leader. He joined QuantaSol in September in a planned move to structure the company for volume manufacture."We are excited to cooperate with QuantaSol in its application of the basic patents of Prof. Alex Freundlich on quantum well solar cells. These joint efforts will advance solar cell technology and help increase our use of renewable resources, " said Alex Ignatiev, director, Center for Advanced Materials, and distinguished university professor of physics, chemistry, and electrical and computer engineering for the University of Houston.
ROSSANA HERNANDEZ
ESTADO SOLIDO


Dilute nitrides tailor the wavelength of semiconductor disk lasers

Interest is growing rapidly in efficient and compact optically pumped semiconductor disk lasers (OP-SDLs) since they provide a practical solution for generating high-power radiation at visible wavelengths. In particular, red-green-blue SDLs are thought to satisfy the demanding requirements of laser displays and projectors. Other applications, such as spectroscopy and biomedicine, are also expected to benefit greatly from the wavelength versatility and excellent beam quality offered by OP-SDLs. Also known as vertical external cavity surface-emitting lasers,1,2 OP-SDLs combine many of the advantages of traditional solid-state lasers with the versatility offered by semiconductor gain materials. Such laser sources can deliver Watt-level diffraction-limited output beams in a broad spectral range determined by the gain material. The key element of an OP-SDL is the semiconductor gain mirror, which is placed in an external laser cavity configuration, as shown in Figure 1.
This arrangement allows a nonlinear crystal to be placed into the cavity for frequency conversion. The most notable results demonstrated with visible SDLs have been obtained in the blue-green region by frequency doubling 940nm and 1060nm laser radiation.3 However, the development of frequency-doubled OP-SDLs at red-orange wavelengths has been hindered by the lack of suitable semiconductor materials for fabricating high-quality gain mirrors operating at around 1200–1250nm. To tackle this problem, we have developed gallium indium nitride arsenide / gallium arsenide (GaInNAs/GaAs) gain regions that can be integrated with high-quality gallium arsenide / aluminum arsenide (GaAs/AlAs) distributed Bragg reflectors (DBRs). DBRs act as mirrors for a specific wavelength range related to the optical thickness of its constituent layers, so the GaInNAs/GaAs gain regions and GaAs/AlAs DBRs together act as a gain mirror.


GaInNAs/GaAs quantum-wells (QWs) have traditionally been used as gain regions in edge-emitting semiconductor lasers operating at around 1.3μm. As a downside for the use of dilute nitride materials, it should be noted that incorporation of nitrogen (N) within the GaInAs lattice leads to the creation of non-radiative recombination centers that have a detrimental effect on the laser efficiency, ultimately limiting the maximum power. The power scaling depends largely on the efficiency of heat removal from the gain region. This is commonly achieved by using a transparent high thermal conductance material, such as diamond, silicon carbide (SiC), or sapphire as a heat spreader, which is placed between the semiconductor sample and a metallic heat-sink. Our research was aimed primarily at developing high quality GaInNAs/GaAs gain structures incorporating a large number of QWs that would allow high power operation. The first trial resulted in the demonstration of 1230nm OP-SDL emitting ∼1.2W of optical power at room temperature4 and >300mW of red radiation by frequency doubling.5

After further optimization, the laser efficiency and high power operation have been improved significantly.6 The gain mirrors were grown on an n-type GaAs (100) substrate by solid source molecular beam epitaxy (MBE) equipped with a radio frequency plasma source for incorporating nitrogen into the crystal lattice. The optimized structure consisted of a 30-pair GaAs/AlAs DBR and a gain region made of ten GaInNAs quantum wells with relatively low (∼0.6–0.7%) nitrogen content. Compared to the first trial structure, the number of QWs and the N content of the QWs had been decreased in order to reduce the amount of non-radiative recombination centers caused by nitrogen incorporation. Another optimization concerned the plasma source that has been operated at lower powers (∼200W).

Gain chips measuring 2.5×2.5mm2 have been cut from the as-grown SDL wafer and capillary-bonded with water to a ∼3×3×0.3mm3 type IIa natural diamond heat spreader. The bonded chips were fixed between two copper plates with indium foil in between to ensure good thermal and mechanical contact. The mounted samples were attached to a water-cooled copper heat-sink and implemented in linear (see Figure 1) or V-shaped SDL cavities. As Figure 2 shows, by using a 2.5% output coupler we have obtained a record high output power of 3.5W of 1220nm emission with the threshold and the slope efficiency of ∼2.7W and ∼20%, respectively. The temperature of the mount in these measurements was 15°C and the pump beam diameter on the gain element was ∼180μm.

The gain chip also has been used in a Z-shaped cavity to demonstrate efficient intracavity frequency doubling.7 The total output power emitted at 612nm reached a value of ∼2.7W, yielding a conversion efficiency of 7.4% from pump to red radiation. We have also demonstrated an 8nm tuning range for the output spectrum.
ROSSANA HERNANDEZ
ESTADO SOLIDO


Introduction to Dilute Nitrides

Arsenide and phosphide based III-V semiconductors have been extensively researched for many years, resulting in mature technologies that are used for many of today's electronics and optoelectronics. These materials are however limited to medium and narrow bandgap applications, preventing the fabrication of wide gap devices such as high power electronics and short wavelength optoelectronics. The development of wide-gap material has been slow and problematic, nevertheless, recent advances in nitrides, such as the development of blue LEDs and lasers, have seen these alloys catapulted into the limelight. This has lead to an explosion of research interest, and the natural progression to bridge the gap between the wide-gap nitrides and the medium-gap arsenides. However, instead of the addition of small amounts of nitrogen to GaAs resulting in the expected increase of bandgap, it was found to have the opposite effect, resulting in a rapid reduction of the bandgap.[1] This unusual behaviour has sparked considerable interest both from a fundamental physics point of view as well as for potential narrow-gap applications. These new hybrid alloys, which have become known as "dilute nitrides", are the topic of this current work. In the late eighties interest in wide-gap materials for short wavelength optoelectronics (and electronics) began to grow, most research concentrated on zinc selenide (ZnSe) although some work was also carried out on nitrides and silicon carbide (SiC). Despite the indirect bandgap of SiC, it was used in the late eighties to produce the first commercial blue LEDs; unfortunately, the indirect gap meant low efficiencies (~0.03 % [2]) and no scope for producing lasers. Instead, ZnSe-based materials were pursued, leading to the first pulsed blue laser diode in 1991 [3]. Despite subsequent advances that lead to continuous wave room temperature lasing, ZnSe was problematic. Unlike SiC and nitrides that have wide-gaps resulting from strong chemical bonds, ZnSe's gap is due to its highly ionic bonds that are weak. As a result, defect growth and propagation is common, leading to device degradation. In addition, ZnSe suffers from poor electrical/thermal properties and Fermi level pinning. Nitride research dates back to the early seventies [4] when many physical properties such as refractive index,[5] bandgap [6] and lattice constant [7] were measured. However, interest soon diminished, as it was discover that the strong background n-type doping prevented the growth of p-type material and no suitable substrate materials were available. Interest in nitrides was rekindled in the early nineties when a small research group led by Nakamura at a virtually unheard of chemical company in Japan reported blue emission from InGaN devices. The application of innovative growth techniques to the nitride system led to rapid advances in material quality and commercially viable devices. The problems associated with substrate mismatch were overcome using buffer layers,[8, 9] and background doping was reduced via optimised growth. The key breakthrough of p-doping was finally achieved using magnesium dopant activated by electron beam irradiation [10] or thermal annealing.[11] This allowed control over both n and p-type doping, hence nitride based p-n junctions could be produced and subsequently advance heterostructures LEDs and lasers.[12]

The first steps towards bridging the gap between arsenides and nitrides was made in 1992 by Weyers et.al.,[1] resulting in the unexpected discovery of a rapid reduction in bandgap energy with increasing nitrogen. In most, if not all other, III-V alloys, when a semiconductor element is replaced by one of smaller ionic radius, the band gap energy increases. When small amounts of nitrogen were added to GaAs, instead of the expected blue shift in emission, a considerable red shift was observed.[1] Furthermore, the decrease in energy per atomic percent of nitrogen was more than ten times greater than the typical increase in other semiconductor alloys. While this behaviour meant that the dilute nitrides could not be used for visible light emitters, fundamental physics as well as potential applications were clear incentives to pursue these materials. Surprisingly, the next few years saw very little published work on dilute nitrides.

Interest in dilute nitrides really began in the mid nineties after Kondow et.al. published results on the quaternary alloy, GaInNAs.[13, 14] This new alloy allowed independent control over the In:Ga and N:As ratios. Increasing the In:Ga ratio causes a reduction in bandgap and an increase in lattice parameter, while increasing the N:As ratio also causes bandgap reduction, but a decrease in the lattice parameter. GaInNAs, therefore, gives the flexibility of tailoring both bandgap and lattice parameter. Such tailoring potential opens up a wide range of possible applications, however, the 1.3 mm lasers based on GaAs for optical communications were identified as a key application. At this wavelength silica fibre has zero dispersion and relatively low attenuation, making it an attractive communications window. Many of today's medium haul systems operate in the 1.3 mm window, and if transceiver systems could be made economical then they could be used in local area networks. The first laser to operate in the 1.3 mm window was produced in 1976 by J. Hsieh, using InGaAsP/InP,[15] since then most, if not all, 1.3 mm systems have used InP based lasers. Unfortunately, this material system is not ideal for producing cheap lasers as a number of problems ultimately increase costs. While some innovative attempts have been made to solve these problems, many are far from ideal, often causing additional problems or using processing techniques that are not easily integrated into commercial production. Instead of solving the problems, considerable research efforts are currently being put into finding alternative materials that avoid the problems altogether. InGaAs has been extensively researched and investigations have been done to see how far the material can be pushed towards long wavelength emissions. While highly strained InGaAs QWs lasers operating out to around 1.2 mm have been produced with good characteristics using strain-compensated QWs,[16, 17] increasing the wavelength further becomes very difficult. Lasers operating close to 1.3 mm based on GaAsSb QWs have been demonstrated,[18] however, the conduction band discontinuity between GaAsSb and GaAs is believed to be small [19] resulting in high leakage currents and hence poor performance.
At present, the main research drive for alternative 1.3 mm lasers is split between self-organised quantum dots (QD) and dilute nitrides. QD lasers have attracted substantial interest, as the physics of QDs could potentially improve laser performance considerably. They are expected to have reduced temperature dependence,[20] reduced thresholds and higher efficiencies.[21] However, this can only be realised if methods are found to control dot density, distribution and, most importantly, size. Even small size fluctuations can 'smear' the density of states, producing bulk-like behaviour. While considerable progress has been made towards dot uniformity, there appears to be some trade off with dot density, hence gain.[22] In addition, the expected temperature performance of QD lasers has not yet been demonstrated, so far devices have exhibited poor characteristic temperatures no better than InP lasers.[23]
Considerable interest in dilute nitrides for long wavelength lasers was stimulated by the first reported GaInNAs lasers.[13] The materials were expected to have very good temperature characteristics resulting from the predicted large electron confinement. In addition, being based on GaAs, dilute nitrides would be easily integrated with the established GaAs technology, including AlGaAs based Bragg mirrors. However, producing high quality dilute nitride has proved difficult, with increasing nitrogen fraction resulted in reduced optical quality.[13, 24-28] Post-growth annealing was soon found to improve the optical quality, however, the increase in optical quality was usually accompanied by a blue shift,[29] which partly offset the red shift induced by nitrogen incorporation. Despite these problems, early research lead to the demonstration of a range of devices and a gradual improvement in material quality.[30] Progress in dilute nitride devices has been rapid, 1.3 mm laser emission was realised in 1998,[31] and good characteristic temperatures have been reported.[32, 33] The emission wavelength has even been pushed out to 1.515 mm using GaInNAs with high indium and nitrogen fractions.[34, 35] Unfortunately, many early lasers had high thresholds and low slope efficiencies compared to nitrogen-free lasers. These problems have largely been attributed to poor crystal quality, which is hardly surprising in a new material system. However, considerable improvements have been reported recently, with some 1.3 mm single and triple quantum well lasers having thresholds as low as 400 and 680 A/cm2 respectively.
ROSSANA HERNANDEZ
ESTADO SOLIDO


Dilute nitride charactherization






Plasma suorce induced ion damage


















ROSSANA HERNANDEZ
ESTADO SOLIDO